Agela Unisol Technology and Column Products

SKU: Agela Unisol
Agela Unisol Technology and Column Products Bonna-Agela's unique sol-gel process technology generates an uniform surface that produces an universal column applicable to several kinds of HPLC applications. Peak tailing adversely affects chromat
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Agela Unisol Technology and Column Products

        Bonna-Agela's unique sol-gel process technology generates an uniform surface that produces an universal column

applicable to several kinds of HPLC applications. Peak tailing adversely affects chromatographic efficiency and reduces the accuracy and precision of the data. Peak  tailing and insufficient retention of polar compounds are among the toughest problems for silica based reversed phase columns. High acidity of the surface silanols, non-uniformity of the surface, and non-uniformity of the bonding process are the three major causes of peak tailing.

Synthetic silica with high purity is typically obtained by hydrolyzing silicic acid esters followed by high temperature

sinteration. The sintered silica is further leached with dilute acid to enrich silanol on the surface. The process does not generate a uniform, silanol covered surface. It will create some isolated silanol groups with very strong acidity or some "un-leached islands" during the leaching process. Furthermore, the high temperature procedure may cause the formation of micro-crystallization domains on the silica, further contributing to the nonuniformity of the surface.

Unisol process technology is specifically designed to solve these problems. In our patented Unisol process, gas phase tetramethoxy silane is adsorbed evenly on the silica surface. It is subsequently hydrolyzed by a controlled amount of moisture. A fresh layer of silanols is then formed by a mild heating process. This process produces a surface with low acidity and high uniformity, which is further bonded with a C18 silane, and then di-functional end-capped. The overall process yields an excellent HPLC stationary phase with a very smooth surface that is friendly to basic compounds (minimal ionic interactions) and polar compounds (provides significantly increased retention).


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